Decoration member

ABSTRACT

A decoration member including: a color developing layer including a light reflective layer and a light absorbing layer provided on the light reflective layer; and a substrate provided on one surface of the color developing layer. The light absorbing layer includes a copper oxynitride (Cu a O b N c ).

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a U.S. national stage of international ApplicationNo. PCT/KR2018/015948, filed on Dec. 14, 2018, and claims priority toand the benefit of Korean Patent Application No. 10-2017-0173250, filedwith the Korean Intellectual Property Office on Dec. 15, 2017, andKorean Patent Application No. 10-2018-0093368, filed with the KoreanIntellectual Property Office on Aug. 9, 2018, the entire contents ofwhich are incorporated herein by reference.

TECHNICAL FIELD

The present application relates to a decoration member.

BACKGROUND

For cosmetic containers, various mobile devices and electronic products,product design such as colors, shapes and patterns play a major role inproviding product value to customers in addition to product functions.Product preferences and prices are also dependent on design.

As for cosmetic compact containers as one example, various colors andcolor senses are obtained using various methods and used in products. Amethod of providing colors to a case material itself or a method ofproviding designs by attaching a deco film implementing colors andshapes to a case material may be included.

In existing deco films, attempts have been made to develop colorsthrough methods such as printing and deposition. When expressingheterogeneous colors on a single surface, printing needs to be conductedtwo or more times, and implementation is hardly realistic when applyingvarious colors to a three-dimensional pattern. In addition, existingdeco films have fixed colors depending on a viewing angle, and even whenthere is a slight change, the change is limited to just a difference inthe color sense.

SUMMARY

The present application is directed to providing a decoration member.

One embodiment of the present specification provides a decoration memberincluding a color developing layer including a light reflective layerand a light absorbing layer provided on the light reflective layer; anda substrate provided on one surface of the color developing layer,

wherein the light absorbing layer includes a copper oxynitride(Cu_(a)O_(b)N_(c)), and

when a component analysis is performed through a transmission X-rayanalysis on an any one point of the light absorbing layer, corepresented by the following Equation 1 is 0.71 or greater:

$\begin{matrix}{\omega = {\left( T_{x} \right) \times \left( \sigma_{x} \right)}} & \left\lbrack {{Equation}\mspace{14mu} 1} \right\rbrack \\{{Tx} = {\left\{ {T_{1} - {\left\lbrack \frac{T_{1}}{T_{0}} \right\rbrack \times T_{0}}} \right\} \times \left( T_{0} \right)^{- 1}}} & \left\lbrack {{Equation}\mspace{14mu} 2} \right\rbrack \\{\sigma_{x} = \frac{10b}{a - {3c}}} & \left\lbrack {{Equation}\mspace{14mu} 3} \right\rbrack\end{matrix}$

In Equation 1, T_(x) is represented by Equation 2, and σ_(x) isrepresented by Equation 3,

in Equation 2, T₁ is a thickness of the light absorbing layer includingany one point of the light absorbing layer on which the componentanalysis is performed,

$\left\lbrack \frac{T_{1}}{T_{0}} \right\rbrack$

is a maximum integer that is not greater than

$\frac{T_{1}}{T_{0}},$

and T₀ is 70 nm,

when T₁ is m*T₀, T_(x) is 1, when T₁ is not m*T₀, Tx satisfies Equation2, and m is an integer of 1 or greater, and

in Equation 3, a means an element content ratio of copper (Cu), b meansan element content ratio of oxygen (O), and c means an element contentratio of nitrogen (N).

A decoration member according to one embodiment of the presentspecification is capable of displaying cool tone colors by including alight absorbing layer including a copper oxynitride and having eachelement content adjusted to a specific ratio.

The present application provides a decoration member having dichroismdisplaying different colors depending on a viewing direction and havingimproved visibility of the dichroism.

BRIEF DESCRIPTION OF DRAWINGS

FIG. 1 is a schematic illustration of a decoration member according toone embodiment of the present specification.

FIG. 2 is a schematic illustration of a method of distinguishing a lightabsorbing layer and a light reflective layer.

FIG. 3 is a schematic illustration of one point of a light absorbinglayer and a thickness of the light absorbing layer including the same.

FIG. 4 is a schematic illustration of a principle of light interferencein a light absorbing layer and a light reflective layer.

FIG. 5 to FIG. 13E are schematic illustrations of various decorationmembers according to one embodiment of the present specification

FIG. 14 to FIG. 26B are schematic illustrations of shapes of a patternlayer according to various exemplary embodiments.

FIG. 27 to FIG. 30 are scanning electron microscope (SEM) images of theshapes of a pattern layer according to various exemplary embodiments.

FIG. 31A to FIG. 31I are schematic illustrations of shapes of a patternlayer according to various exemplary embodiments.

FIG. 32 and FIG. 33 represent color wheels showing warm and cool tones,respectively.

FIG. 34 is a chart showing thickness-dependent changes in the color of adecoration member according to an experimental example.

FIG. 35 is a graphical representation of Equation 2A.

DETAILED DESCRIPTION

Hereinafter, the present specification will be described in detail.

In the present specification, “or” represents, unless defined otherwise,a case of selectively or all including those listed, that is, a meaningof “and/or”.

In the present specification, a “layer” means covering 70% or more of anarea where the corresponding layer is present. It means coveringpreferably 75% or more, and more preferably 80% or more.

In the present specification, a “thickness” of a certain layer means ashortest distance from a lower surface to an upper surface of thecorresponding layer.

In the present specification, colors displayed by a decoration membermay be defined by spectral characteristics of a light source,reflectance of an object, and color visual efficiency of an observer.

For objective color expression, colors need to be measured in a standardlight source and by a standard observer, and colors are expressed in acoordinate of color space. Colors of a decoration member may bedisplayed by a CIE Lab (L*a*b*) coordinate or a LCh coordinate providingvisually uniform color space. L* represents brightness, +a* representsredness, −a* represents greenness, +b* represents yellowness and −b*represents blueness, and C* and h* will be described later. In the colorspace, a total color difference depending on an observation position maybe expressed as ΔE·ab=√{square root over ((ΔL)²+(Δa)²+(Δb)²)}.

The colors may be measured using a spectrophotometer (CM-2600d,manufactured by Konica Minolta, Inc.), and reflectance of a sample maybe measured through a spectrophotometer and reflectance for eachwavelength may be obtained, and from this, spectral reflectance graphand a converted color coordinate may be obtained. Herein, data areobtained at an 8-degree viewing angle, and, in order to see dichroism ofa decoration member, measurements are made in a horizontal direction anda vertical direction with respect to the decoration member.

The viewing angle is an angle formed by a straight line (d1) in a normaldirection of a color developing layer surface of a decoration member anda straight line (d2) passing through the spectrophotometer and one pointof the decoration member to measure, and generally has a range of 0degrees to 90 degrees.

Having a viewing angle of 0 degrees means measuring in the samedirection as a normal direction of a color developing layer surface of adecoration member.

In the present specification, a “light absorbing layer” and a “lightreflective layer” are layers having properties relative to each other,and the light absorbing layer may mean a layer having higher lightabsorbance compared to the light reflective layer, and the lightreflective layer may mean a layer having higher light reflectivitycompared to the light absorbing layer.

The light absorbing layer and the light reflective layer may each beformed in a single layer, or in a multilayer of two or more layers.

In the present specification, the light absorbing layer and the lightreflective layer are named by their functions. For light having aspecific wavelength, a layer reflecting relatively more light may beexpressed as the light reflective layer, and a layer reflectingrelatively less light may to be expressed as the light absorbing layer.

FIG. 1 illustrates a laminated structure of a decoration memberaccording to one embodiment of the present specification. FIG. 1illustrates a decoration member including a color developing layer (100)and a substrate (101). The color developing layer (100) includes a lightreflective layer (201) and a light absorbing layer (301). FIG. 1illustrates a structure in which the substrate (101) is provided on thelight absorbing layer (301) side of the color developing layer (100),however, the substrate may also be provided on the light reflectivelayer (201) side.

The light absorbing layer and the light reflective layer are illustratedin FIG. 2. In the decoration member of FIG. 2, each layer is laminatedin order of a L_(i−1) layer, a L_(i) layer and a L_(i+1) layer based ona light entering direction, an interface I_(i) is located between theL_(i−1) layer and the L_(i) layer, and an interface I_(i+1) is locatedbetween the L_(i) layer and the L_(i+1) layer.

When irradiating light having a specific wavelength in a directionperpendicular to each layer so that thin film interference does notoccur, reflectance at the interface I_(i) may be expressed by thefollowing Mathematical Equation 1:

       [Mathematical  Equation  1]$\frac{\left\lbrack {{n_{i}(\lambda)} - {n_{i - 1}(\lambda)}} \right\rbrack^{2} + \left\lbrack {{k_{i}(\lambda)} - {k_{i - 1}(\lambda)}} \right\rbrack^{2}}{\left\lbrack {{n_{i}(\lambda)} + {n_{i - 1}(\lambda)}} \right\rbrack^{2} + \left\lbrack {{k_{i}(\lambda)} + {k_{i - 1}(\lambda)}} \right\rbrack^{2}}.$

In Mathematical Equation 1, n_(i)(λ) means a refractive index dependingon the wavelength (λ) of the i^(th) layer, and k_(i)(λ) means anextinction coefficient depending on the wavelength (λ) of the i^(th)layer. The extinction coefficient is a measure capable of defining howstrongly a subject material absorbs light at a specific wavelength, andthe definition is the same as a definition provided later.

Using Mathematical Equation 1, when a sum of reflectance for eachwavelength at the interface I_(i) calculated at each wavelength isR_(i), R_(i) may be expressed by the following Mathematical Equation 2:

       [Mathematical  Equation  2]$R_{i} = {\frac{\sum_{\lambda = {380\mspace{11mu} {nm}}}^{\lambda = {780\mspace{14mu} {nm}}}{\frac{\left\lbrack {{n_{i}(\lambda)} - {n_{i - 1}(\lambda)}} \right\rbrack^{2} + \left\lbrack {{k_{i}(\lambda)} - {k_{i - 1}(\lambda)}} \right\rbrack^{2}}{\left\lbrack {{n_{i}(\lambda)} + {n_{i - 1}(\lambda)}} \right\rbrack^{2} + \left\lbrack {{k_{i}(\lambda)} + {k_{i - 1}(\lambda)}} \right\rbrack^{2}}{\Delta\lambda}}}{\sum_{\lambda = {380\mspace{11mu} {nm}}}^{\lambda = {780\mspace{14mu} {nm}}}{\Delta\lambda}}.}$

Hereinafter, a decoration member including the light reflective layerand the light absorbing layer described above will be described.

One embodiment of the present specification provides a decoration memberincluding a color developing layer including a light reflective layerand a light absorbing layer provided on the light reflective layer; anda substrate provided on one surface of the color developing layer,

wherein the light absorbing layer includes a copper oxynitride(Cu_(a)O_(b)N_(c)), and

when a component analysis is performed through a transmission X-rayanalysis on an any one point of the light absorbing layer, ω representedby the following Equation 1 is 0.71 or greater:

$\begin{matrix}{\omega = {\left( T_{x} \right) \times \left( \sigma_{x} \right)}} & \left\lbrack {{Equation}\mspace{14mu} 1} \right\rbrack \\{{Tx} = {\left\{ {T_{1} - {\left\lbrack \frac{T_{1}}{T_{0}} \right\rbrack \times T_{0}}} \right\} \times \left( T_{0} \right)^{- 1}}} & \left\lbrack {{Equation}\mspace{14mu} 2} \right\rbrack \\{\sigma_{x} = \frac{10b}{a - {3c}}} & \left\lbrack {{Equation}\mspace{14mu} 3} \right\rbrack\end{matrix}$

In Equation 1, T_(x) is represented by Equation 2, and σ_(x) isrepresented by Equation 3,

in Equation 2, T₁ is a thickness of the light absorbing layer includingany one point of the light absorbing layer on which the componentanalysis is performed,

$\left\lbrack \frac{T_{1}}{T_{0}} \right\rbrack$

is a maximum integer that is not greater than

$\frac{T_{1}}{T_{0}},$

and T₀ is 70 nm,

when T₁ is m*T₀, T_(x) is 1, when T₁ is not m*T₀, Tx satisfies Equation2, and m is an integer of 1 or greater, and

in one embodiment of the present specification, when T₁ is m*T₀, T_(x)is 1, when T₁ is not m*T₀, Tx satisfies Equation 2, and m is an integerof 1 or greater. The value of m may be an integer of 1 to 5.

In Equation 3, a means an element content ratio of copper (Cu), b meansan element content ratio of oxygen (O), and c means an element contentratio of nitrogen (N). For example, when the content of the copper (Cu),the content of the oxygen (O) and the content of the nitrogen (N) at theone point are 57.5%, 9.8% and 39.7%, respectively, a, b and c may beexpressed as 0.575, 0.098 and 0.397, respectively.

In the present specification, the content ratio of a specific elementmay mean an atomic percent (at %) of a specific element at any one pointof the light absorbing layer on which the component analysis isperformed.

In the decoration member according to one embodiment of the presentspecification, cool colors (cool tone) may be observed through the lightabsorbing layer by the light absorbing layer including a copperoxynitride (Cu_(a)O_(b)N_(c)), adjusting a content ratio of each elementof the copper oxynitride, and adjusting a thickness of the lightabsorbing layer to a specific range. Herein, the relation between thecontent ratio of each element of the copper oxynitride and the thicknessof the light absorbing layer may be expressed as ω, a cool toneparameter, represented by Equation 1. Alternatively, the cool toneparameter ω may be expressed as ω_(c). The subscript c of ω_(c) means acool tone.

In one embodiment of the present specification, w represented byEquation 1 with respect to any one point (x) of the light absorbinglayer may be greater than or equal to 0.71 and less than or equal to1.85, preferably greater than or equal to 0.71 and less than or equal to1.8, and more preferably greater than or equal to 0.72 and less than orequal to 1.75. When satisfying the above-mentioned numerical range, coolcolors (cool tone) may be observed through the light absorbing layer,and among the cool colors, a color that a user wants may be readilydisplayed.

In the present specification, the ‘any one point of the light absorbinglayer’ may mean any one point on a surface of or inside the lightabsorbing layer.

In one embodiment of the present specification, T_(x) is a thicknessparameter represented by Equation 2. As the light absorbing layerthickness changes, warm colors (warm tone) or cool colors (cool tone)appear alternately, and color changes appear with the thickness having acertain period (T₀). Herein, Tx may mean a ratio of the light absorbinglayer thickness (T₁) at any one point with respect to the certain period(T₀) of the light absorbing layer thickness. For example, when thecertain period of the thickness is 70 nm, the Tx value when the lightabsorbing layer has a thickness of 40 nm, 110 nm and 180 nm is the sameas 0.571.

In one embodiment of the present specification, Equation 2 may berepresented by the following Equation 2A:

$\begin{matrix}{{{f\left( T_{1} \right)} = {\frac{T_{1}}{T_{0}}\left( {0 < T_{1} \leq T_{0}} \right)}}{{f\left( T_{1} \right)} = {f\left( {T_{1} + {n \times T_{0}}} \right)}}} & \left\lbrack {{Equation}\mspace{14mu} 2A} \right\rbrack\end{matrix}$

In Equation 2A, T_(x) is a function value according to T₁ of thefunction represented by f(T₁), n is a positive integer of 1 or greater,T₁ is a thickness of the light absorbing layer including any one pointof the light absorbing layer on which the component analysis isperformed, and T₀ is 70 nm.

Equation 2A represents a periodic function f(T₁) of a thickness (T₁) ofthe light absorbing layer. It means having the same f(T₁) value at aperiod T₀. This is graphically represented in FIG. 35. As shown in FIG.35, f(T₁) appearing in a range of (0<T₁≤T₀) repeatedly appears having acertain period (T₀). For example, f(0.5T₀) when T₁=0.5T₀ and f(1.5T₀)when T₁=0.5T₀+T₀ have the same value of 0.5.

In Equation 2, T₁ is a thickness of the light absorbing layer includingany one point of the light absorbing layer. T₁ means, when selecting anyone point of the light absorbing layer, a thickness of the lightabsorbing layer including the one point. When observing a cross-sectionof the light reflective layer through a scanning electron microscope(SEM) and the like, an interface may be identified between the lightreflective layer and the light absorbing layer, and it may be identifiedthat a layer including a copper oxynitride (CuON) is the light absorbinglayer through a component analysis. Herein, any one point of the lightabsorbing layer is selected, and a thickness of the light absorbinglayer including the any one point may be measured to be used as T₁.

In one embodiment of the present specification, a, b and c are the sameas or different from each other, and may each have a value of greaterthan 1 and less than 1.

In one embodiment of the present specification, a+b+c may be 1.

The thickness T₁ may mean, in a cross-section in a directionperpendicular to a surface direction of the light absorbing layer whileincluding any one point of the light absorbing layer, a length in thesurface direction of the light absorbing layer.

FIG. 3 illustrates a method of determining one point and a thickness ofthe light absorbing layer. When selecting any one point (the solidcircle identified in FIG. 3) of the light absorbing layer, a contentratio parameter represented by Equation 3 is calculated through acomponent analysis on this point, and a width of a line segmentperpendicular to a surface direction of the light absorbing layer amonglight segments passing through this point is measured to calculate thethickness (T₁).

In addition, T₁ may be achieved by controlling a process pressure usedin deposition, a flow rate of a reactive gas with respect to a plasmagas, a voltage, a deposition time or a temperature when forming thelight absorbing layer.

In Equation 2,

$\left\lbrack \frac{T_{1}}{T_{0}} \right\rbrack$

is a maximum integer that is not greater than

$\frac{T_{1}}{T_{0}}.$

[x] is a Gaussian symbol generally used in the field to which thistechnology belongs or in the mathematical field, and means a maximuminteger that is not greater than x.

In the decoration member of the present disclosure, a cool tone or awarm tone repeatedly appears with a certain period depending on changesin the thickness of the light absorbing layer. Herein, T₀ may beexpressed as a “period of a light absorbing layer thickness in which acool tone repeatedly appears”.

In one embodiment of the present specification, the thickness T₁ of thelight absorbing layer is 70 nm or less, and Tx may be represented by thefollowing Equation 2-1:

Tx=T ₁ /T ₀.   [Equation 2-1]

In Equation 2-1, T₁ and T₀ have the same definitions as in Equation 2.

In Equation 3, a means an element content ratio of copper (Cu), b meansan element content ratio of oxygen (O), and c means an element contentratio of nitrogen (N). The element content ratio of each element of thelight absorbing layer may be measured using methods generally used inthe art, and an X-ray photoelectron spectroscopy ( )PS) method orelectron spectroscopy for chemical analysis (ESCA, Thermo FisherScientific Inc.) may be used.

In the present specification, the transmission X-ray analysis may be theX-ray photoelectron spectroscopy method.

In one embodiment of the present specification, the thickness parameterTx may be greater than or equal to 0.51 and less than or equal to 1,greater than or equal to 0.51 and less than or equal to 0.99, preferablygreater than or equal to 0.55 and less than or equal to 0.95, and morepreferably greater than or equal to 0.6 and less than or equal to 0.9.When satisfying the above-mentioned numerical range, cool colors (cooltone) may be more clearly observed in the decoration member.

In one embodiment of the present specification, the content ratioparameter σ_(x) may be greater than or equal to 1.1 and less than orequal to 1.9, preferably greater than or equal to 1.2 and less than orequal to 1.8, and more preferably greater than or equal to 1.2 and lessthan or equal to 1.7. When satisfying the above-mentioned numericalrange, cool colors (cool tone) may be more clearly observed in thedecoration member. The ratio between these elements may be achieved bycontrolling a gas fraction when depositing the copper oxynitride.

Specifically, after performing qualitative analyses by conducting asurvey scan in light to absorbing layer surface and thickness directionsusing an X-ray photoelectron spectroscopy (XPS) method or electronspectroscopy for chemical analysis (ESCA, Thermo Fisher ScientificInc.), a quantitative analysis is performed with a narrow scan. Herein,the qualitative analysis and the quantitative analysis are performed byobtaining the survey scan and the narrow scan under the condition of thefollowing Table 1. Peak background uses a smart method.

TABLE 1 Element Scan Section Binding Energy Step Size Narrow (Snapshot)20.89 eV 0.1 eV Survey −10 eV to 1350 eV 1 eV

In addition, the component analysis may be performed by preparing alight absorbing layer slice having the same composition of the lightabsorbing layer before laminating the decoration member. Alternatively,when the decoration member has a structure of substrate/patternlayer/light reflective layer/light absorbing layer, an outermost edge ofthe decoration member may be analyzed using the method described above.In addition, the light absorbing layer may be visually identified byobserving a photograph of a cross-section of the decoration member. Forexample, when the decoration member has a structure of substrate/patternlayer/light reflective layer/light absorbing layer, the presence of aninterface between each layer is identified in a photograph of across-section of the decoration member, and an outermost layercorresponds to the light absorbing layer.

In one embodiment of the present specification, a hue-angle h* in CIELCh color space of the light absorbing layer may be in a range of 105°to 315°, a range of 120° to 300°, a range of 135° to 300°, a range of160° to 300°, or a range of 200° to 300°.

When the hue-angle h* is in the above-mentioned range, a cool tone maybe observed from the decoration member. A cool tone means satisfying theabove-mentioned numerical range in CIE LCh color space. Colorscorresponding to a warm tone are shown in FIG. 32 and colorscorresponding to a cool tone are shown in FIG. 33.

In one embodiment of the present specification, the light absorbinglayer may have L of 0 to 100 or 30 to 100 in CIE LCh color space.

In one embodiment of the present specification, the light absorbinglayer may have C of 0 to 100, 1 to 80 or 1 to 60 in CIE LCh color space.

In the present specification, the CIE LCh color space is CIE Lab colorspace, and herein, cylinder coordinates C* (chroma, relative colorsaturation), a distance from L axis, and h* (hue-angle, hue-angle in CIELab hue circle) are used instead of a* and b* of Cartesian coordinates.

In one embodiment of the present specification, the light absorbinglayer preferably has a refractive index (n) of 0 to 8 at a wavelength of400 nm, and the refractive index may be from 0 to 7, may be from 0.01 to3, and may be from 2 to 2.5. The refractive index (n) may be calculatedby sin θ1/sin θ2 (θ1 is an angle of light incident on a surface of thelight absorbing layer, and θ2 is a refraction angle of light inside thelight absorbing layer).

In one embodiment of the present specification, the light absorbinglayer preferably has a refractive index (n) of 0 to 8 in a wavelengthrange of 380 nm to 780 nm, and the refractive index may be from 0 to 7,may be from 0.01 to 3, and may be from 2 to 2.5.

In one embodiment of the present specification, the light absorbinglayer has an extinction coefficient (k) of greater than 0 and less thanor equal to 4 at 400 nm, and the extinction coefficient is preferablyfrom 0.01 to 4, may be from 0.01 to 3.5, may be from 0.01 to 3, and maybe from 0.1 to 1. The extinction coefficient (k) is −λ/4πI (dI/dx)(herein, a value multiplying λ/4π with dI/I is a reduced fraction oflight intensity per a path unit length (dx), for example 1 m, in thelight absorbing layer, and λ is a wavelength of light).

In one embodiment of the present specification, the light absorbinglayer has an extinction coefficient (k) of greater than 0 and less thanor equal to 4 in a wavelength range of 380 nm to 780 nm, and theextinction coefficient is preferably from 0.01 to 4, may be from 0.01 to3.5, may be from 0.01 to 3, and may be from 0.1 to 1. The extinctioncoefficient (k) is in the above-mentioned range at 400 nm, preferably inthe whole visible wavelength region of 380 nm to 780 nm, and therefore,a role of the light absorbing layer may be performed in the visiblerange.

A principle of color development of a light absorbing layer having sucha specific extinction coefficient and refractive index and a principleof color development of a decoration member by adding a dye to anexisting substrate are different. For example, using a method ofabsorbing light by adding a dye to a resin, and using a material havingan extinction coefficient as described above lead to different lightabsorption spectra. When absorbing light by adding a dye to a resin, anabsorption wavelength band is fixed, and only a phenomenon of varying anabsorption amount depending on the changes in the coating thicknessoccurs. In addition, in order to obtain a target light absorptionamount, changes in the thickness of at least a few micrometers or moreare required to adjust the light absorption amount. On the other hand,in materials having an extinction coefficient, a wavelength bandabsorbing light changes even when the thickness changes by a several totens of nanometers.

In addition, when adding a dye to an existing resin, only specificcolors by the dye are developed, and therefore, various colors may notbe displayed. On the other hand, by the light absorbing layer of thepresent disclosure using a specific material instead of a resin, anadvantage of displaying various colors is obtained by an interferencephenomenon of light without adding a dye.

According to the exemplary embodiments, light absorption occurs in anentering path and a reflection path of light in the light absorbinglayer, and by the light reflecting on each of a surface of the lightabsorbing layer (301) and an interface of the light absorbing layer(301) and the light reflective layer (201), the two reflected lights gothrough constructive or destructive interference. In the presentspecification, the light reflected on the surface of the light absorbinglayer may be expressed as surface reflected light, and the lightreflected on the interface of the light absorbing layer and the lightreflective layer may be expressed as interface reflected light. Amimetic diagram of such a working principle is illustrated in FIG. 4.FIG. 4 illustrates a structure in which a substrate (101) is provided ona light reflective layer (201) side, however, the structure is notlimited to such a structure, and as for the substrate (101) location,the substrate may be disposed on other locations.

In one embodiment of the present specification, the light absorbinglayer may be a single layer, or a multilayer of two or more layers.

In one embodiment of the present specification, the light absorbinglayer may further include one, two or more selected from the groupconsisting of metals, metalloids, and oxides, nitrides, oxynitrides andcarbides of metals or metalloids. The oxides, nitrides, oxynitrides orcarbides of metals or metalloids may be formed under a depositioncondition and the like set by those skilled in the art. The lightabsorbing layer may also include the same metals, metalloids, alloys oroxynitrides of two or more types as the light reflective layer.

In one embodiment of the present specification, the thickness (T₁) ofthe light absorbing layer may be determined depending on target colorsin a final structure, and for example, may be greater than or equal to 1nm and less than or equal to 300 nm, greater than or equal to 36 nm andless than or equal to 70 nm, greater than or equal to 106 nm and lessthan or equal to 140 nm, and greater than or equal to 176 nm and lessthan or equal to 210 nm.

In one embodiment of the present specification, the light reflectivelayer is not particularly limited as long as it is a material capable ofreflecting light, however, light reflectance may be to determineddepending on the material. For example, colors are readily expressed at50% or greater of light reflectance. Light reflectance may be measuredusing an ellipsometer.

In one embodiment of the present specification, the light reflectivelayer may be a metal layer, a metal oxide layer, a metal nitride layer,a metal oxynitride layer or an inorganic material layer. The lightreflective layer may be formed in a single layer, or may also be formedin a multilayer of two or more layers.

In one embodiment of the present specification, the light reflectivelayer may be a single layer or a multilayer including one, two or moretypes of materials selected from the group consisting of one, two ormore types of materials selected from among indium (In), titanium (Ti),tin (Sn), silicon (Si), germanium (Ge), aluminum (Al), copper (Cu),nickel (Ni), vanadium (V), tungsten (W), tantalum (Ta), molybdenum (Mo),neodymium (Nd), iron (Fe), chromium (Cr), cobalt (Co), gold (Au) andsilver (Ag); oxides thereof, nitrides thereof; oxynitrides thereof;carbon; and carbon composites.

In one embodiment of the present specification, the light reflectivelayer may include alloys of two or more selected from among theabove-mentioned materials, or oxides, nitrides or oxynitrides thereof.

In one embodiment of the present specification, the light reflectivelayer may allow highly resistant reflective layer by being preparedusing an ink including carbon or carbon composites. Carbon black, CNTand the like may be included as the carbon or carbon composites.

In one embodiment of the present specification, the ink including carbonor carbon composites may include above-described materials, or oxides,nitrides or oxynitrides thereof, and for example, oxides of one, two ormore types of selected from among indium (In), titanium (Ti), tin (Sn),silicon (Si), germanium (Ge), aluminum (Al), copper (Cu), nickel (Ni),vanadium (V), tungsten (W), tantalum (Ta), molybdenum (Mo), neodymium(Nd), iron (Fe), chromium (Cr), cobalt (Co), gold (Au) and silver (Ag)may be included. A curing process may be further carried out afterprinting the ink including carbon or carbon composites.

In one embodiment of the present specification, when the lightreflective layer includes two or more types of materials, the two ormore types of materials may be formed using one process, for example, amethod of deposition or printing, however, a method of first forming alayer using one or more types of materials, and then additionallyforming a layer thereon using one or more types of materials may beused. For example, a light reflective layer may be formed by forming alayer through depositing indium or tin, then printing an ink includingcarbon, and then curing the result. The ink may further include oxidessuch as titanium oxides or silicon oxides.

In one embodiment of the present specification, the thickness of thelight reflective layer may be determined depending on target colors in afinal structure, and for example, may be greater than or equal to 1 nmand less than or equal to 100 nm, greater than or equal to 10 nm andless than or equal to 90 nm, or greater than or equal to 30 nm and lessthan or equal to 90 nm.

Light Absorbing Layer Structure

In one embodiment of the present specification, the light absorbinglayer may have various shapes by adjusting a deposition condition andthe like when forming the light absorbing layer.

In one embodiment of the present specification, the light absorbinglayer includes two or more points with different thicknesses.

In one embodiment of the present specification, the light absorbinglayer includes two or more regions with different thicknesses.

In one embodiment of the present specification, the light absorbinglayer may include an inclined surface.

Examples of the structure according to an exemplary embodiment areillustrated in FIG. 5 and FIG. 6. FIG. 5 and FIG. 6 illustrate astructure in which a light reflective layer (201) and a light absorbinglayer (301) are laminated (substrate not included). As illustrated inFIG. 5 and FIG. 6, the light absorbing layer (301) has two or morepoints with different thicknesses. As illustrated in FIG. 5, thicknessesat points A and B are different in the light absorbing layer (301). Asillustrated in FIG. 6, thicknesses in regions C and D are different inthe light absorbing layer (301).

In one embodiment of the present specification, the light absorbinglayer includes one or more regions in which an upper surface has aninclined surface with an inclined angle of greater than 0 degrees andless than or equal to 90 degrees, and the light absorbing layer includesone or more regions having a thickness different from a thickness in anyone region having the inclined surface. In the inclined surface, anangle formed by any one straight line included in an upper surface ofthe light absorbing layer and a straight line parallel to the lightreflective layer may be defined as the inclined surface. For example, aninclined angle of the upper surface of the light absorbing layer of FIG.5 may be approximately 20 degrees.

Surface properties such as an upper surface slope of the lightreflective layer may be the same as an upper surface of the lightabsorbing layer. For example, by using a deposition method when formingthe light absorbing layer, the upper surface of the light absorbinglayer may have the same slope as the upper surface of the lightreflective layer. However, the upper surface slope of the lightabsorbing layer of FIG. 5 is different from the upper surface slope ofthe light reflective layer.

FIG. 7 illustrates a structure of a decoration member having a lightabsorbing layer in which an upper surface has an inclined surface. Asillustrated in FIG. 7, a substrate (101), a light reflective layer (201)and a light absorbing layer (301) are laminated, and thickness t1 inregion E and thickness t2 in region F are different in the lightabsorbing layer (301). Reference numeral 401 may be a color film.

FIG. 7 relates to a light absorbing layer having inclined surfacesfacing each other, that is, having a structure with a trianglecross-section. In the structure of the pattern having inclined tosurfaces facing each other as in FIG. 7, a thickness of the lightabsorbing layer may be different in two surfaces of the trianglestructure even when deposition is carried out under the same conditions.Accordingly, a light absorbing layer having two or more regions withdifferent thicknesses may be formed using just one process. As a result,developed colors may become different depending on the thickness of thelight absorbing layer. Herein, the thickness of the light reflectivelayer does not affect changes in the color when it is a certainthickness or greater.

FIG. 7 illustrates a structure in which a substrate (101) is provided ona light reflective layer (201) side, however, the structure is notlimited thereto, and as described above, the substrate (101) may also bedisposed on other locations.

In addition, in FIG. 7, the surface adjoining the light reflective layer(201) of the substrate (101) is a flat surface, however, the surfaceadjoining the light reflective layer (201) of the substrate (101) mayhave a pattern having the same slope as an upper surface of the lightreflective layer (201), as illustrated in FIG. 8. This may cause adifference in the thickness of the light absorbing layer due to adifference in the slope of the pattern of the substrate. However, thepresent disclosure is not limited thereto, and even when the substrateand the light absorbing layer are prepared such that they have differentslopes using different deposition methods, the dichroism described abovemay be obtained by having the thickness of the light absorbing layerbeing different on both sides of the pattern.

In one embodiment of the present specification, the light absorbinglayer includes one or more regions with a gradually changing thickness.FIG. 9 illustrates a structure in which a thickness of the lightabsorbing layer (301) layer gradually changes.

In one embodiment of the present specification, the light absorbinglayer includes one or more regions in which an upper surface has aninclined surface with an inclined angle of greater than 0 degrees andless than or equal to 90 degrees, and at least one or more of theregions having an inclined surface has a structure in which a thicknessof the light absorbing layer gradually changes. FIG. 9 illustrates astructure of a light absorbing layer including a region in which anupper surface has an inclined surface. In FIG. 9, both regions G and Hhave a structure in which an upper surface of the light absorbing layerhas an inclined surface, and a thickness of the light absorbing layergradually changes.

In the present specification, the structure in which a thickness of thelight absorbing layer changes means that a cross-section in a thicknessdirection of the light absorbing layer includes a point having asmallest thickness of the light absorbing layer and a point having alargest thickness of the light absorbing layer, and a thickness of thelight absorbing layer increases along the direction of the point havinga smallest thickness of the light absorbing layer with respect to thepoint having a largest thickness of the light absorbing layer. Herein,the point having a smallest thickness of the light absorbing layer andthe point having a largest thickness of the light absorbing layer maymean any point on an interface of the light absorbing layer with thelight reflective layer.

In one embodiment of the present specification, the light absorbinglayer includes a first region having a first inclined surface with aninclined angle in a range of 1 degree to 90 degrees, and may furtherinclude two or more regions in which an upper surface has an inclinedsurface with a different slope direction or a different inclined anglefrom the first inclined surface, or an upper surface is horizontal.Herein, thicknesses in the first region and the two or more regions mayall be different from each other in the light absorbing layer.

Substrate

In one embodiment of the present specification, the decoration memberincludes a substrate provided on one surface of the color developinglayer.

In one embodiment of the present specification, the decoration memberincludes a substrate (101) provided on any one or more of a surfacefacing the light absorbing layer (301) of the light reflective layer(201); or a surface facing the light reflective layer of the lightabsorbing layer. For example, the substrate may be provided on a surfaceopposite to the surface facing the light absorbing layer of the lightreflective layer (FIG. 10A); or a surface opposite to the surface facingthe light reflective layer of the light absorbing layer (FIG. 10B).

In one embodiment of the present specification, the substrate mayinclude a plastic injection molded article or a glass substrate for acosmetic container. More specifically, the plastic injection moldedarticle may include one or more types of polypropylene (PP), polystyrene(PS), polyvinyl acetate (PVAc), polyacrylate, polyethylene terephthalate(PET), polyvinyl chloride (PVC), polymethyl methacrylate (PMMA), anethylene-vinyl acetate copolymer (EVA), polycarbonate (PC), polyamideand a styrene-acrylonitrile copolymer (SAN), but is not limited thereto.

In addition, the plastic injection molded article may be a plate-typeplastic injection molded article without curves (specific pattern), ormay be a plastic injection molded article having curves (specificpattern).

The plastic injection molded article may be prepared using a plasticmolding method. The plastic molding method includes compression molding,injection molding, air blow molding, thermoforming, hotmelt molding,foaming molding, roll molding, reinforced plastic molding and the like.The compression molding is a molding method of placing a material into amold, heating the result, and applying a pressure thereto, and, as thelongest molding method, this may be mainly used in molding thermalcurable resins such as phenol resins. The injection molding is a moldingmethod of pushing out a plastic melt using a transporting device, andfilling a mold therewith through a nozzle, and this method may mold boththermoplastic resins and thermal curable resins, and is a molding methodused the most. The resin used as a cosmetic case is SAN. The air blowmolding is a method of molding a product while placing a plastic parisonin the center of a mold and injecting air thereto, and, as a moldingmethod of making plastic bottles or small containers, the speed ofmanufacturing a product is very fast.

In one embodiment of the present specification, glass havingtransmittance of 80% or greater may be used as the glass substrate.

In one embodiment of the present specification, the substrate thicknessmay be selected as needed, and for example, may have a range of 50 μm to200 μm.

In one embodiment of the present specification, the decoration membermay be prepared using a step of forming a light reflective layer on thesubstrate and a light absorbing layer provided on the light reflectivelayer. More specifically, in the decoration member, the light absorbinglayer and the light reflective layer may be consecutively formed on thesubstrate using a deposition process or the like, or the lightreflective layer and the light absorbing layer may be consecutivelyformed on the substrate using a deposition process or the like, however,the method is not limited thereto.

Color Film

In one embodiment of the present specification, the color developinglayer further includes a color film.

In one embodiment of the present specification, the decoration memberfurther includes a color film on a surface opposite to the surfacefacing the light reflective layer of the light absorbing layer; betweenthe light absorbing layer and the light reflective layer; or on asurface opposite to the surface facing the light absorbing layer of thelight reflective layer. The color film may also perform a role of asubstrate. For example, those that may be used as a substrate may beused as a color film by adding a dye or a pigment thereto.

In one embodiment of the present specification, the color film is notparticularly limited as long as it has a color difference ΔE*ab, adistance in space of L*a*b* in a color coordinate CIE L*a*b* of thecolor developing layer, of greater than 1 when the color film is presentcompared to when the color film is not provided.

Colors may be expressed by CIE L*a*b*, and a color difference may bedefined using a distance (ΔE*ab) in the L*a*b* space. Specifically, thecolor difference is ΔE·ab=√{square root over ((ΔL)²+(Δa)²+(Δb)²)}, andwithin a range of 0<ΔE*ab<1, an observer may not recognize the colordifference [reference document: Machine Graphics and Vision20(4):383-411]. Accordingly, a color difference obtained by the colorfilm addition may be defined by ΔE*ab>1 in the present specification.

FIGS. 11A to 11C illustrate a color developing layer including a colorfilm. FIG. 11A illustrates a structure in which a light reflective layer(201), a light absorbing layer (301) and a color film (401) areconsecutively laminated, FIG. 11B illustrates a structure in which alight reflective layer (201), a color film (401) and a light absorbinglayer (301) are consecutively laminated, and FIG. 11C illustrates astructure in which a color film (401), a light reflective layer (201)and a light absorbing layer (301) are consecutively laminated.

In one embodiment of the present specification, when the substrate isprovided on a surface opposite to the surface facing the light absorbinglayer of the light reflective layer, and the color film is located on asurface opposite to the surface facing the light absorbing layer of thelight reflective layer, the color film may be provided between thesubstrate and the light reflective layer; or on a surface opposite tothe surface facing the light reflective layer of the substrate. Asanother example, when the substrate is provided on a surface opposite tothe surface facing the light reflective layer of the light absorbinglayer, and the color film is located on a surface opposite to thesurface facing the light reflective layer of the light absorbing layer,the color film may be provided between the substrate and the lightabsorbing layer; or on a surface opposite to the surface facing thelight absorbing layer of the substrate.

In one embodiment of the present specification, the substrate isprovided on a surface opposite to the surface facing the light absorbinglayer of the light reflective layer, and the color film is furtherprovided. FIG. 12A illustrates a structure in which the color film (401)is provided on a surface opposite to the light reflective layer (201)side of the light absorbing layer (301), FIG. 12B illustrates astructure in which the color film (401) is provided between the lightabsorbing layer (301) and the light reflective layer (201), FIG. 12Cillustrates a structure in which the color film (401) is providedbetween the light reflective layer (201) and the substrate (101), andFIG. 12D illustrates a structure in which the color film (401) isprovided on a surface opposite to the light reflective layer (201) sideof the substrate (101). FIG. 12E illustrates a structure in which thecolor films (401 a, 401 b, 401 c, 401 d) are provided on a surfaceopposite to the light reflective layer (201) side of the light absorbinglayer (301), between the light absorbing layer (301) and the lightreflective layer (201), between the light reflective layer (201) and thesubstrate (101), and on a surface opposite to the light reflective layer(201) side of the substrate (101), respectively, however, the structureis not limited thereto, and 1 to 3 of the color films (401 a, 401 b, 401c, 401 d) may not be included.

In one embodiment of the present specification, the substrate isprovided on a surface opposite to the surface facing the lightreflective layer of the light absorbing layer, and the color film isfurther provided. FIG. 13A illustrates a structure in which the colorfilm (401) is provided on a surface opposite to the light absorbinglayer (301) side of the substrate (101), FIG. 13B illustrates astructure in which the color film (401) is provided between thesubstrate (101) and the light absorbing layer (301), FIG. 13Cillustrates a structure in which the color film (401) is providedbetween the light absorbing layer (301) and the light reflective layer(201), and FIG. 13D illustrates a structure in which the color film(401) is provided on a surface opposite to the light absorbing layer(301) side of the light reflective layer (201). FIG. 13E illustrates astructure in which the color films (401 a, 401 b, 401 c, 401 d) areprovided on a surface opposite to the light absorbing layer (201) sideof the substrate (101), between the substrate (101) and the lightabsorbing layer (301), between the light absorbing layer (301) and thelight reflective layer (201), and on a surface opposite to the lightabsorbing layer (201) side of the light reflective layer (201),respectively, however, the structure is not limited thereto, and 1 to 3of the color films (401 a, 401 b, 401 c, 401 d) may not be included.

In the structures such as FIG. 12B and FIG. 13C, the light reflectivelayer may reflect light entering through the color film when the colorfilm has visible light transmittance of greater than 0%, and therefore,colors may be obtained by laminating the light absorbing layer and thelight reflective layer.

In the structures such as FIG. 12C, FIG. 12D and FIG. 13D, lighttransmittance of the colors developed from the color film of the lightreflective layer (201) may be 1% or greater, preferably 3% or greaterand more preferably 5% or greater so that changes in the colordifference obtained by the color film addition may be recognized. Thisis due to the fact that light transmitted in such a visible lighttransmittance range may be mixed with colors obtained by the color film.

In one embodiment of the present specification, the color film may beprovided as one sheet, or as a laminate of 2 sheets or more that are thesame or different types.

As the color film, those capable of developing target colors bycombining with colors developed from the laminated structure of thelight reflective layer and the light absorbing layer described above maybe used. For example, color films expressing colors by one, two or moretypes of pigments and dyes being dispersed into a matrix resin may beused. Such a color film may be formed by directly coating a compositionfor forming a color film on a color film-providable location, or amethod of preparing a color film by coating a composition for forming acolor film on a separate substrate or using a known molding method suchas casting or extrusion, and then disposing or attaching the color filmon a color film-providable location may be used. As the coating method,wet coating or dry coating may be used.

The pigment and the dye capable of being included in the color film maybe selected from among those capable of obtaining target colors from afinal decoration member, and known in the art, and one, two or moretypes among pigments and dyes such as red-based, yellow-based,purple-based, blue-based or pink-based may be used. Specifically, dyessuch as perinone-based red dyes, anthraquinone-based red dyes,methane-based yellow dyes, anthraquinone-based yellow dyes,anthraquinone-based purple dyes, phthalocyanine-based blue dyes,thioindigo-based pink dyes or isoxindigo-based pink dyes may be usedeither alone or as a combination. Pigments such as carbon black, copperphthalocyanine (C.I. Pigment Blue 15:3), C.I. Pigment Red 112, Pigmentblue or isoindoline yellow may be used either alone or as a combination.As such dyes or pigments, those commercially available may be used, andfor example, materials manufactured by Ciba ORACET or Chokwang PaintLtd. may be used. Types of the dyes or pigments and colors thereof arefor illustrative purposes only, and various known dyes or pigments maybe used, and more diverse colors may be obtained therefrom.

As the matrix resin included in the color film, materials known asmaterials of transparent films, primer layers, adhesive layers orcoating layers may be used, and the matrix resin is not particularlylimited to these materials. For example, various materials such asacyl-based resins, polyethylene terephthalate-based resins,urethane-based resins, linear olefin-based resins, cycloolefin-basedresins, epoxy-based resins or triacetylcellulose-based resins may beselected, and copolymers or mixtures of the materials illustrated abovemay also be used.

When the color film is disposed closer to the location observing adecoration member than the light reflective layer or the light absorbinglayer as in, for example, the structures of FIGS. 12A and 12B, and FIGS.13A to 13C, light transmittance of the colors developed by the colorfilm from the light reflective layer, the light absorbing layer or thelaminated structure of the light reflective layer and the lightabsorbing layer may be 1% or greater, preferably 3% or greater and morepreferably 5% or greater. As a result, target colors may be obtained bycombining colors developed from the color film and colors developed fromthe light reflective layer, the light absorbing layer or the laminatedstructure thereof.

The thickness of the color film is not particularly limited, and thoseskilled in the art may select and set the thickness as long as it iscapable of obtaining target colors. For example, the color film may havea thickness of 500 nm to 1 mm.

Pattern Layer

In one embodiment of the present specification, the substrate includes apattern layer, and the pattern layer is provided adjacent to the colordeveloping layer.

In the present specification, the pattern layer being provided adjacentto the color developing layer may mean the pattern layer being in directcontact with the color developing layer. For example, the pattern layermay be in direct contact with the light reflective layer of the colordeveloping layer, or the pattern layer may be in direct contact with thelight absorbing layer of the color developing layer.

In one embodiment of the present specification, the pattern layerincludes a convex portion or concave portion shape having anasymmetric-structured cross-section.

In one embodiment of the present specification, the pattern layerincludes a convex portion shape having an asymmetric-structuredcross-section.

In one embodiment of the present specification, the pattern layerincludes a concave portion shape having an asymmetric-structuredcross-section.

In one embodiment of the present specification, the pattern layerincludes a convex portion shape having an asymmetric-structuredcross-section and a concave portion shape having anasymmetric-structured cross-section.

In the present specification, the “cross-section” means a surface whencutting the convex portion or concave portion in any one direction. Forexample, the cross-section may mean, when placing the decoration memberon the ground, a surface when cutting the convex portion or concaveportion in a direction parallel to the ground or a directionperpendicular to the ground. In the surface of the convex portion orconcave portion shape of the pattern layer of the decoration memberaccording to the embodiment, at least one of the cross-sections in adirection perpendicular to the ground has an asymmetric structure.

In the present specification, the “asymmetric-structured cross-section”means a structure in which a figure formed with the borders of thecross-section does not have line symmetry or point symmetry. Linesymmetry refers to a property of figures overlapping when mirroring acertain figure centering on a straight line. Point symmetry refers to,when a certain figure rotates 180 degrees based on one point, having asymmetrical property completely overlapping the original figure. Herein,the borders of the asymmetric-structured cross-section may be a straightline, a curved line or a combination thereof.

In one embodiment of the present specification, in the convex portion orconcave portion shape having an asymmetric-structured cross-section, atleast one cross-section includes two or more sides having differentinclined angles, different curvatures, or different side shapes. Forexample, when two sides among the sides forming at least onecross-section have different inclined angles, different curvatures, ordifferent side shapes, the convex portion or concave portion has anasymmetric structure.

As described above, the decoration member may develop dichroism by theconvex portion or concave portion having an asymmetric-structuredcross-section included in the surface of the pattern layer. Dichroismmeans different colors being observed depending on a viewing angle.Colors may be expressed by CIE L*a*b*, and a color difference may bedefined using a distance (ΔE*ab) in the L*a*b* space. Specifically, thecolor difference is ΔE·ab=√{square root over ((ΔL)²+(Δa)²+(Δb)²)}, andwithin a range of 0<ΔE*ab<1, an observer may not recognize the colordifference [reference document: Machine Graphics and Vision20(4):383-411]. Accordingly, dichroism may be defined by ΔE*ab>1 in thepresent specification.

In one embodiment of the present specification, the color developinglayer has dichroism of ΔE*ab>1. Specifically, a color difference ΔE*ab,a distance in L*a*b* space in a color coordinate CIE L*a*b* of the colordeveloping layer, may be greater than 1.

In one embodiment of the present specification, the decoration memberhas dichroism of ΔE*ab>1. Specifically, a color difference ΔE*ab, adistance in L*a*b* space in a color coordinate CIE L*a*b* of the wholedecoration member, may be greater than 1.

In one embodiment of the present specification, the shape of the convexportion or concave portion includes a first inclined surface and asecond inclined surface having different inclined angles.

In one embodiment of the present specification, in the shape of theconvex portion or concave portion, at least one cross-section includes afirst inclined side and a second inclined side having different inclinedangles. Shapes of the first inclined side and the second inclined sideare the same as or different from each other, and are each astraight-line shape or a curved-line shape.

In one embodiment of the present specification, the borders of theasymmetric-structured cross-section are a straight line, a curved lineor a combination thereof.

FIG. 14 illustrates the first inclined side and the second inclined sidehaving a straight-line shape. Each convex portion shape includes a firstarea (D1) including a first inclined side and a second area (D2)including a second inclined side. The first inclined side and the secondinclined side have a straight-line shape. An angle (c3) formed by thefirst inclined side and the second inclined side may be from 75 degreesto 105 degrees. An angle (c1) formed by the first inclined side and theground (substrate) and an angle (C2) formed by the second inclined sideand the ground are different. For example, a combination of c1 and c2may be 20 degrees/80 degrees, 10 degrees/70 degrees or 30 degrees/70degrees.

FIGS. 18A and 18B illustrate the first inclined side or the secondinclined side having a curved-line shape. The cross-section of thepattern layer has a convex portion shape, and the cross-section of theconvex portion shape includes a first area (E1) including a firstinclined side and a second area (E2) including a second inclined side.Any one or more of the first inclined side and the second inclined sidemay have a curved-line shape. For example, the first inclined side andthe second inclined side may both have a curved-line shape, or the firstinclined side may have a straight-line shape, and the second inclinedside may have a curved-line shape. When the first inclined side has astraight-line shape and the second inclined side has a curved-lineshape, the angle cl may be larger than the angle c2. FIGS. 15A and 15Billustrate the first inclined side having a straight-line shape and thesecond inclined side having a curved-line shape. The angle formed by theinclined side having a curved-line shape with the ground may becalculated from, when drawing an arbitrary straight line from a pointwhere the inclined side touching the ground to a point where the firstinclined side adjoins the second inclined side, an angle formed by thestraight line and the ground. The curved-line-shaped second inclinedside may have a different curvature depending on the pattern layerheight, and the curved line may have a radius of curvature. The radiusof curvature may be 10 times or less than the width (E1+E2) of theconvex portion shape. FIG. 15A shows a radius of curvature of the curvedline being twice the width of the convex portion shape, and FIG. 15Bshows a radius of curvature of the curved line being the same as thewidth of the convex portion shape. A ratio of the part (E2) having acurvature with respect to the width (E1+E2) of the convex portion may be90% or less. FIGS. 15A and 15B illustrate a ratio of the part (E2)having a curvature with respect to the width (E1+E2) of the convexportion being 60%.

In the present specification, the inclined angle of the inclined sidemay be treated the same as the inclined angle of the inclined surface.

In the present specification, unless mentioned otherwise, the “side” maybe a straight line, but is not limited thereto, and a part or all may bea curved line. For example, the side may include a structure of a partof an arc of a circle or oval, a wave structure or a zigzag.

In the present specification, when the side includes a part of an arc ofa circle or oval, the circle or oval may have a radius of curvature. Theradius of curvature may be defined by, when converting an extremelyshort section of a curved line into an arc, the radius of the arc.

In the present specification, the inclined angle of the convex portionmay mean an angle formed by an inclined surface of the convex portionand a horizontal surface of the pattern layer. Unless particularlymentioned otherwise in the present specification, the first inclinedsurface may be defined as a left inclined surface of the convex portion,and the second inclined surface may mean a right inclined surface of theconvex portion in the drawings.

In the present specification, unless particularly mentioned otherwise,the first inclined side may be defined as a left inclined side of theconvex portion and the second inclined side may be defined as a rightinclined side of the convex portion in the drawing.

In the present specification, unless mentioned otherwise, the “inclinedside” means, when placing the decoration member on the ground, a sidehaving an angle formed by a side with respect to the ground beinggreater than 0 degrees and less than or equal to 90 degrees. Herein,when the side is a straight line, an angle formed by the straight lineand the ground may be measured. When the side includes a curved line, anangle formed by, when placing the decoration member on the ground, theground and a straight line connecting a point of the side closest to theground and a point of the side farthest from the ground in a shortestdistance may be measured.

In the present specification, unless mentioned otherwise, the “inclinedsurface” means, when placing the decoration member on the ground, asurface having an angle formed by a surface with respect to the groundbeing greater than 0 degrees and less than or equal to 90 degrees.Herein, when the surface is a flat surface, an angle formed by the flatsurface and the ground may be measured. When the surface includes acurved surface, an angle formed by, when placing the decoration memberon the ground, the ground and a straight line connecting a point of thesurface closest to the ground and a point of the surface farthest fromthe ground in a shortest distance may be measured.

In the present specification, unless mentioned otherwise, the “inclinedangle” is an angle formed by, when placing the decoration member on theground, the ground and a surface or side forming the pattern layer, andis greater than 0 degrees and less than or equal to 90 degrees.Alternatively, it may mean an angle formed by the ground and a segment(a′-b′) made when connecting a point (a′) where a surface or sideforming the pattern layer adjoins the ground and a point (b′) where asurface or side forming the pattern layer is farthest from the ground.

In the present specification, unless mentioned otherwise, the“curvature” means a degree of changes in the slope of the tangent atcontinuous points of a side or surface. As the change in the slope ofthe tangent at continuous points of a side or surface is larger, thecurvature is high.

In the present specification, the convex portion may be a convex portionunit shape, and the concave portion may be a concave portion unit shape.The convex portion unit shape or the concave portion unit shape means ashape including two inclined sides (first inclined side and secondinclined side), and is not a shape including three or more inclinedsides. As illustrated in FIG. 18, the convex portion (P1) of the circleC1 is one convex portion unit shape including a first inclined side anda second inclined side. However, the shape included in the circle C2includes two convex portion unit shapes. The first inclined side may bedefined as a left inclined side of the convex portion or concaveportion, and the second inclined side may mean a right inclined side ofthe convex portion or concave portion.

In one embodiment of the present specification, an angle formed by thefirst inclined side and the second inclined side may be in a range of 80degrees to 100 degrees. Specifically, the angle may be 80 degrees orgreater, 83 degrees or greater, 86 degrees or greater or 89 degrees orgreater, and may be 100 degrees or less, 97 degrees or less, 94 degreesor less or 91 degrees or less. The angle may mean an angle of a vertexformed by the first inclined side and the second inclined side. When thefirst inclined side and the second inclined side do not form a vertexwith each other, the angle may mean an angle of a vertex in a stateforming a vertex by virtually extending the first inclined side and thesecond inclined side.

In one embodiment of the present specification, a difference between theinclined angle of the first inclined side and the inclined angle of thesecond inclined side of the may be in a range of 30 degrees to 70degrees in the convex portion. The difference between the inclined angleof the first inclined side and the inclined angle of the second inclinedside may be, for example, 30 degrees or greater, 35 degrees or greater,40 degrees or greater or 45 degrees or greater, and may be 70 degrees orless, 65 degrees or less, 60 degrees or less or 55 degrees or less.Having the difference between the inclined angles of the first inclinedside and the second inclined side in the above-mentioned range may beadvantageous in terms of obtaining direction-dependent color expression.In other words, when a difference in the inclined angle of the inclinedside is in the above-mentioned range, thicknesses of the light absorbinglayers each formed on the first inclined side and the second inclinedside may become different, and as a result, dichroism may become greaterwhen looking at the decoration member from the same direction (refer tothe following Table 2).

TABLE 2 Difference in Inclined Angle of First Inclined Side of FirstSide of Second Side and Second Inclined Side Inclined Side Inclined SideL₁* a₁* b₁* L₂* a₂* b₂* ΔE*ab 0 25.6 1.2 −1.3 23.8 1.4 −1.8 1.9 10 25.61.2 −1.3 24.0 1.4 −2.6 2.1 20 25.6 1.2 −1.3 24.9 0.8 −2.4 1.4 30 34.61.1 −5.7 23.8 1.1 −1.1 11.7 40 34.0 1.1 −5.7 23.8 1.1 −1.1 11.2 50 38.10.8 −6.3 24.0 1.1 −1.1 15.0 60 39.2 1.2 −6.9 23.8 1.1 −1.1 16.5

In one embodiment of the present specification, the cross-section of theconvex portion or concave portion shape may be a polygonal shape oftriangle or square. FIG. 16 illustrates the convex portion shape being asquare shape. The square shape may be a general square shape, and is notparticularly limited as long as an inclined angle of each inclined sideis different. The square shape may be a shape left after partiallycutting a triangle. For example, a trapezoid in which one pair ofopposite sides is parallel, or a square shape in which a pair ofopposite sides parallel to each other is not present may be included.The convex portion shape includes a first area (F1) including a firstinclined side, a second area (F2) including a second inclined side and athird area (F3) to including a third inclined side. The third inclinedside may or may not be parallel to the ground. For example, when thesquare shape is a trapezoid, the third inclined side is parallel to theground. Any one or more of the first inclined side to the third inclinedside may have a curved-line shape, and descriptions on the curved-lineshape are the same as the descriptions provided above. The combinedlength of F1+F2+F3 may be defined as a pitch of the convex portionshape.

FIG. 19 illustrates a method of determining the shape of the convexportion shape. For example, the convex portion shape may have a shaperemoving a specific area of the ABO1 triangle shape. A method ofdetermining the removed specific area is as follows. Details on theinclined angles c1 and c2 are the same as the descriptions providedabove.

1) An arbitrary point P1 on an AO1 segment dividing the AO1 segment in aratio of L1:L2 is set.

2) An arbitrary point P2 on a BO1 segment dividing the BO1 segment in aratio of m1:m2 is set.

3) An arbitrary point O2 on an AB segment dividing the AB segment in aratio of n1:n2 is set.

4) An arbitrary point P3 on an O1O2 segment dividing the O2O1 segment ina ratio of o1:o2 is set.

Herein, the ratios of L1:L2, m1:m2, n1:n2 and o1:o2 are the same as ordifferent from each other, and may be each independently from 1:1000 to1000:1.

5) The area formed by the P1O1P2P3 polygon is removed.

6) The shape formed by the ABP2P3P1 polygon is employed as thecross-section of the convex portion.

The convex portion shape may be modified to various forms by adjustingthe ratios of L1:L2, m1:m2, n1:n2 and o1:o2. For example, the height ofthe pattern may increase when the L1 and m1 increase, and the height ofthe concave portion formed on the convex portion may decrease when theof increases, and by adjusting the ratio of n1, the position of thelowest point of the concave portion formed on the convex portion may beadjusted to be closer to any one side of the inclined sides of theconvex portion.

When the ratios of L1:L2, m1:m2 and o1:o2 are all the same, thecross-section shape may be a trapezoidal shape (FIG. 20A). The height ofthe trapezoid (ha, hb) may vary by adjusting the ratio of L1:L2. Forexample, FIG. 20A illustrates a convex portion shape prepared when theL1:L2 ratio is 1:1, and FIG. 20B illustrates a convex portion shapeprepared when the L1:L2 ratio is 2:1, and the m1:m2 ratio is 1:1 and theo1:o2 ratio is 1:8.

In one embodiment of the present specification, the convex portion orconcave portion shape includes two or more of the convex portion orconcave portion shapes. By having two or more of the convex portion orconcave portion shapes as above, dichroism may become greater. Herein,the two or more convex portion or concave portion shapes may have a formof repeating identical shapes, however, shapes different from each othermay be included. This is shown in FIG. 21 to FIG. 23B.

FIG. 21 illustrates two or more convex portion shapes that are differentfrom each other being alternately arranged. A shape in which a secondconvex portion (P2) having a smaller height compared to the convexportion is disposed between the convex portions (P1) may be obtained.Hereinafter, the convex portion stated prior to the second convexportion may be referred to as a first convex portion.

FIG. 22 illustrates a concave portion being included between two or moreconvex portion shapes. The pattern layer surface may have a shapefurther including a concave portion (P3) having a smaller heightcompared to the convex portion on a tip portion (pointed part) of theconvex portion (P1). Such a decoration member may exhibit an effect ofan image color softly changing depending on a viewing angle.

In FIGS. 23A and 23B, each shape may be arranged in an inversed phasestructure. Like this, the pattern layer includes a convex portion orconcave portion shape, and each of the shapes may be arranged in aninversed phase structure.

Specifically, as illustrated in FIG. 23A, the pattern layer surface mayhave a shape of a plurality of convex portions being arranged in aninversed phase structure of 180 degrees. Specifically, the pattern layersurface may include a first area (C1) in which the second inclinedsurface has a larger inclined angle compared to the first inclinedsurface, and a second area (C2) in which the second inclined surface hasa larger inclined angle compared to the first inclined surface. In oneexample, the convex portion included in the first area may be referredto as a first convex portion (P1), and the convex portion included inthe second area may be referred to as a fourth a convex portion (P4). Asfor heights, widths, inclined angles and an angle formed by the firstand the second inclined surfaces of the first convex portion (P1) andthe fourth convex portion (P4), descriptions provided in the convexportion (P1) section may be used in the same manner.

As illustrated in FIG. 23B, any one area of the first area and thesecond area corresponds to an image or a logo, and the other areacorresponds to a background part. Such a decoration member may exhibitan effect of an image or logo color softly changing depending on aviewing angle. In addition, a decorative effect of colors of an image orlogo part and a background part looking switched depending on a viewingdirection.

The first area and the second area may each include a plurality ofconvex portions. Widths and the number of convex portions of the firstarea and the second area may be properly controlled depending on thesize of a target image or logo.

In one embodiment of the present specification, the pattern layerincludes two or more convex portion shapes, and may further include aflat portion in all or a part between each convex portion shape.

As illustrated in FIGS. 17A and 17B, a flat portion (G1) may be includedbetween each convex portion of the pattern layer. The flat portion meansan area where a convex portion is not present. Other than the patternlayer further including a flat portion, descriptions on the remainingconstituents (D1, D2, c1, c2, c3, first inclined side and secondinclined side) are the same as the descriptions provided above.Meanwhile, the combined length of D1+D2+G1 is defined as a pitch of thepattern, which is different from the width of the pattern describedabove. A height (H1) of the convex portion (P1), as illustrated in FIG.21, may be from 5 μm to 30 μm. Having the convex portion height in theabove-mentioned range may be advantageous in a production processaspect.

In the present specification, the convex portion height may mean ashortest distance between the highest part and the lowest part of theconvex portion based on the horizontal surface of the pattern layer. Asfor the descriptions relating to the height of the convex portion, thesame numerical range may also be used in the depth of the concaveportion described above.

A width (W1) of the convex portion (P1), as illustrated in FIG. 21, maybe from 10 μm to 90 μm. Having the convex portion width in theabove-mentioned range may be advantages in a process aspect inprocessing and forming a pattern. The width of the convex portion (P1)may be, for example, 10 μm or greater, 15 μm or greater, 20 μm orgreater or 25 μm or greater, and may be 90 μm or less, 80 μm or less, 70μm or less, 60 μm or less, 50 μm or less, 40 μm or less or 35 μm orless. The descriptions relating to the width may be used in the concaveportion described above as well as the convex portion.

A distance between the convex portions (P1) may be from 0 μm to 20 μm.The distance between the convex portions in the present specificationmay mean, in two adjacent convex portions, a shortest distance between apoint where one convex portion ends and a point where another convexportion starts. When properly maintaining the distance between theconvex portions, a phenomenon of a reflection area looking dark due toshading when a relatively bright color is to be obtained may be improvedwhen looking at the decoration member from an inclined surface side ofthe convex portion having a larger inclined angle. Between the convexportions, a second convex portion with a smaller height compared to theconvex portion may be present as to be described later. The descriptionsrelating to the distance may be used in the concave portion describedabove as well as the convex portion.

A height (H2) of the second convex portion (P2), as illustrated in FIG.21, may be in a range of ⅕ to ¼ of the height (H1) of the first convexportion (P1). For example, a height difference (H1−H2) between the firstconvex portion and the second convex portion may be from 10 μm to 30 μm.A width (W2) of the second convex portion may be from 1 μm to 10 μm.Specifically, the width (W2) of the second convex portion may be 1 μm orgreater, 2 μm or greater, 3 μm or greater, 4 μm or greater or 4.5 μm orgreater, and may be 10 μm or less, 9 μm or less, 8 μm or less, 7 μm orless, 6 μm or less or 5.5 μm or less.

In one embodiment of the present specification, as illustrated in FIG.21, the second convex portion may have two inclined surfaces (S3, S4)having different inclined angles. An angle (a4) formed by the twoinclined surfaces of the second convex portion may be from 20 degrees to100 degrees. Specifically, the angle (a4) may be 20 degrees or greater,30 degrees or greater, 40 degrees or greater, 50 degrees or greater, 60degrees or greater, 70 degrees or greater, 80 degrees or greater or 85degrees or greater, and may be 100 degrees or less or 95 degrees orless. An inclined angle difference (a6−a5) between both inclinedsurfaces of the second convex portion may be from 0 degrees to 60degrees. The inclined angle difference (a6−a5) may be 0 degrees orgreater, 10 degrees or greater, 20 degrees or greater, 30 degrees orgreater, 40 degrees or greater or 45 degrees or greater, and may be 60degrees or less or 55 degrees or less. The second convex portion havinga dimension in the above-mentioned range may be advantageous in terms offorming bright color by increasing light inflow from a side surfacehaving a large inclined surface angle.

In one embodiment of the present specification, a height (H3) of theconcave portion (P3), as illustrated in FIG. 22, may be from 3 μm to 15μm. Specifically, a height (H3) of the concave portion (P3) may be 3 μmor greater, and may be 15 μm or less, 10 μm or less or 5 μm or less. Theconcave portion may have two inclined surfaces (S5, S6) having differentinclined angles. An angle (a7) formed by the two inclined surfaces ofthe concave portion may be from 20 degrees to 100 degrees. Specifically,the angle (a7) may be 20 degrees or greater, 30 degrees or greater, 40degrees or greater, 50 degrees or greater, 60 degrees or greater, 70degrees or greater, 80 degrees or greater or 85 degrees or greater, andmay be 100 degrees or less or 95 degrees or less.

An inclined angle difference (a9−a8) between both inclined surfaces ofthe concave portion may be from 0 degrees to 60 degrees. The inclinedangle difference (a9−a8) may be 0 degrees or greater, 10 degrees orgreater, 20 degrees or greater, 30 degrees or greater, 40 degrees orgreater or 45 degrees or greater, and may be 60 degrees or less or 55degrees or less. The concave portion having a dimension in theabove-mentioned range may be advantageous in terms that a color sensemay be added on the inclined surface.

In one embodiment of the present specification, the convex portion orconcave portion shape on the pattern layer surface may be a cone-shapedconvex portion protruding outward from the surface of the pattern layeror a cone-shaped concave portion caved-in inward from the surface of thepattern layer.

In one embodiment of the present specification, the cone shape includesa shape of a circular cone, an oval cone or a polypyramid. Herein, theshape of the bottom surface of the polypyramid includes a triangle, asquare, a star shape having 5 or more protruding points, and the like.According to one embodiment, when the pattern layer has a cone-shapedconvex portion shape when placing the decoration member on the ground,at least one of vertical cross-sections of the convex portion shape withrespect to the ground may have a triangular shape. According to anotherembodiment, when the pattern layer has a cone-shaped concave portionshape when placing the decoration member on the ground, at least one ofvertical cross-sections of the concave portion shape with respect to theground may have an inverted triangular shape.

In one embodiment of the present specification, the cone-shaped convexportion or the cone-shaped concave portion shape may have at least oneasymmetric-structured cross-section. For example, when observing thecone-shaped convex portion or concave portion from a surface side of theconvex portion or concave portion shape, having two or less identicalshapes present when rotating 360 degrees based on the vertex of the coneis advantageous in developing dichroism. FIGS. 24A and 24B are schematicillustrations of a view when observing the cone-shaped convex portionshape from a surface side of the convex portion shape. FIG. 24Aillustrates various symmetric-structured cone shapes, and FIG. 24Billustrates various asymmetric-structured cone shapes.

When placing the decoration member on the ground, thesymmetric-structured cone shape has a structure in which a cross-sectionin a direction parallel to the ground (hereinafter, referred to ashorizontal cross-section) is a circle or a regular polygon having thesame side lengths, and the vertex of the cone is present on a verticalline with respect to the cross-section of the center of gravity of thehorizontal cross-section with respect to the ground. However, the coneshape having an asymmetric-structured cross-section has a structure inwhich, when observing from a surface side of the cone-shaped convexportion or concave portion shape, the position of the vertex of the coneis present on a vertical line of a point that is not the center ofgravity of the horizontal cross-section of the cone, or has a structurein which the horizontal cross-section of the cone is anasymmetric-structured polygon or oval. When the horizontal cross-sectionof the cone is an asymmetric-structured polygon, at least one of thesides and the angles of the polygon may be designed to be different fromthe rest.

For example, as illustrated in FIG. 25, the position of the vertex ofthe cone may be changed. Specifically, when designing the vertex of thecone to be located on a vertical line of the center of gravity (O1) ofthe horizontal cross-section of the cone with respect to the ground whenobserving from a surface side of the cone-shaped convex portion as inthe first drawing of FIG. 25, 4 identical structures may be obtainedwhen rotating 360 degrees based on the vertex of the cone (4-foldsymmetry). However, the symmetric structure is broken by designing thevertex of the cone at a position (O2) that is not the center of gravity(O1) of the horizontal cross-section with respect to the ground. Whenemploying a length of one side of the horizontal cross-section withrespect to the ground as x, migration distances of the vertex of thecone as a and b, a height of the cone shape, which is a length of a linevertically connecting from the vertex of the cone (O1 or O2) to thehorizontal cross-section with respect to the ground, as h, and an angleformed by the horizontal cross-section and a side surface of the cone asθn, cosine values for Surface 1, Surface 2, Surface 3 and Surface 4 ofFIG. 25 may be obtained as follows:

${\cos ({\Theta 1})} = {{\frac{\left( \frac{x}{2} \right)}{{sqrt}\left( {h^{2} + \left( \frac{x}{2} \right)^{2}} \right)}\mspace{20mu} {\cos ({\Theta 3})}} = \frac{\left( {\frac{x}{2} - a} \right)}{{sqrt}\left( {h^{2} + \left( {\frac{x}{2} - a} \right)^{2}} \right)}}$${\cos ({\Theta 2})} = {{\frac{\left( \frac{x}{2} \right)}{{sqrt}\left( {h^{2} + \left( \frac{x}{2} \right)^{2}} \right)}\mspace{20mu} {\cos ({\Theta 4})}} = {\frac{\left( {\frac{x}{2} - b} \right)}{{sqrt}\left( {h^{2} + \left( {\frac{x}{2} - b} \right)^{2}} \right)}.}}$

Herein, θ1 and θ2 are the same, and therefore, there is no dichroism.However, θ3 and θ4 are different, and |θ3−θ4| means a color differencebetween two colors (ΔE*ab), and therefore, dichroism may be obtained.Herein, |θ3−θ4|>0. As above, how much the symmetric structure is broken,that is, a degree of asymmetry, may be represented quantitatively usingan angle formed by the horizontal cross-section with respect to theground and a side surface of the cone, and the value representing such adegree of asymmetry is proportional to a color difference of dichroism.

FIGS. 26A and 26B illustrates surfaces having a convex portion shape inwhich the highest point has a line shape. FIG. 26A illustrates a patternhaving a convex portion developing no dichroism and FIG. 26B illustratesa pattern having a convex portion developing dichroism. An X-X′cross-section of FIG. 26A is an isosceles triangle or an equilateraltriangle, and a Y-Y′ cross-section of FIG. 26B is a triangle havingdifferent side lengths.

In one embodiment of the present specification, the pattern layer has asurface of a convex portion shape in which the highest point has a lineshape or a concave portion shape in which the lowest point has a lineshape. The line shape may be a straight-line shape or a curved-lineshape, and may include both a curve and a straight line, or a zigzagshape. This is shown in the scanning election microscope (SEM) images ofFIG. 27 to FIG. 29. When observing the surface of the convex portionshape in which the highest point has a line shape or the concave portionshape in which the lowest point has a line shape from a surface side ofthe convex portion or concave portion shape, having only one identicalshape when rotating 360 degrees based on the center of gravity of thehorizontal cross-section with respect to the ground of the convexportion or the concave portion is advantageous in developing dichroism.

In one embodiment of the present specification, the pattern layer has asurface of a convex portion or concave portion shape in which acone-type tip portion is cut. As shown in the images of FIG. 30, whenplacing a decoration member on the ground, an inversed trapezoidalconcave portion in which a cross-section perpendicular to the ground isasymmetric. Such an asymmetric cross-section may have a trapezoidal orinversed trapezoidal shape. In this case, dichroism may also bedeveloped by the asymmetric-structured cross-section.

In addition to the structures illustrated above, various surfaces ofconvex portion or concave portion shapes as illustrated in FIGS. 31A to31I may be obtained.

In the present specification, unless mentioned otherwise, the “surface”may be a flat surface, but is not limited thereto, and a part or all maybe a curved surface. For example, the shape of a cross-section in adirection perpendicular to the surface may include a structure of a partof an arc of a circle or oval, a wave structure or a zigzag.

In one embodiment of the present specification, the pattern layerincludes a symmetric-structured pattern. As the symmetric structure, aprism structure, a lenticular lens structure and the like are included.

In one embodiment of the present specification, the decoration memberincludes a pattern layer including a convex portion or concave portionshape having an asymmetric-structured cross-section on a surface facingthe light reflective layer of the light absorbing layer; between thelight absorbing layer and the light reflective layer; or a surfacefacing the light absorbing layer of the light reflective layer.

In one embodiment of the present specification, the pattern layer has aflat portion on a surface opposite to the convex portion or concaveportion shape-formed surface, and the flat portion may be formed on asubstrate. As the substrate layer, a plastic substrate may be used. Asthe plastic substrate, triacetyl cellulose (TAC); cycloolefin copolymers(COP) such as norbornene derivatives; poly(methyl methacrylate) (PMMA);polycarbonate (PC); polyethylene (PE); polypropylene (PP); polyvinylalcohol (PVA); diacetyl cellulose (DAC); polyacrylate (Pac); polyethersulfone (PES); polyetheretherketon (PEEK); polyphenylsulfone (PPS),polyetherimide (PEI); polyethylene naphthalate (PEN); polyethyleneterephthalate (PET); polyimide (PI); polysulfone (PSF); polyarylate(PAR), amorphous fluorine resins or the like may be used, however, theplastic substrate is not limited thereto.

In one embodiment of the present specification, the pattern layer mayinclude a thermal curable resin or an ultraviolet curable resin. As thecurable resin, photocurable resins or thermal curable resins may beused. As the photocurable resin, ultraviolet curable resins may be used.Examples of the thermal curable resin may include silicone resins,silicon resins, furan resins, polyurethane resins, epoxy resins, aminoresins, phenol resins, urea resins, polyester resins, melamine resins orthe like, but are not limited thereto. Typical examples of theultraviolet curable resin may include acrylic polymers such as polyesteracrylate polymers, polystyrene acrylate polymers, epoxy acrylatepolymers, polyurethane acrylate polymers or polybutadiene acrylatepolymers, silicone acrylate polymers, alkyl acrylate polymers or thelike, but are not limited thereto.

In one embodiment of the present specification, a color dye may befurther included inside or on at least one surface of the pattern layer.Including a color dye on at least one surface of the pattern layer may,for example, mean a case of including a color dye in the substrate layerdescribed above provided on a flat portion side of the pattern layer.

In one embodiment of the present specification, as the color dye,anthraquinone-based dyes, phthalocyanine-based dyes, thioindigo-baseddyes, perinone-based dyes, isoxindigo-based dyes, methane-based dyes,monoazo-based dyes, 1:2 metal complex-based dyes and the like may beused.

In one embodiment of the present specification, when including the colordye inside the pattern layer, the dye may be added to the curable resin.When further including the color dye below the pattern layer, a methodof coating a layer including the dye above or below the substrate layermay be used.

In one embodiment of the present specification, the color dye contentmay be, for example, from 0 wt % to 50 wt %. The color dye content maydetermine transmittance and a haze range of the pattern layer or thedecoration member, and the transmittance may be, for example, from 20%to 90%, and the haze may be, for example, from 1% to 40%.

In one embodiment of the present specification, the color developinglayer may give metal texture and depth of color when looking at thedecoration member. The color developing layer allows an image of thedecoration member to be seen in various colors depending on the viewingangle. This is due to the fact that the wavelength of light passing thepattern layer and reflected on an inorganic material layer surfacechanges depending on the wavelength of incident light.

The color developing layer may have the same convex portion or concaveportion as the surface of the pattern layer described above. The colordeveloping layer may have the same slope as the surface of the patternlayer described above.

In one embodiment of the present specification, the decoration memberincludes a protective layer provided between the substrate and the colordeveloping layer; a surface facing the substrate of the color developinglayer; or a surface facing the color developing layer of the substrate.

In one embodiment of the present specification, the decoration memberincludes a protective layer provided any one or more of between thesubstrate and the pattern layer, between the pattern layer and the lightreflective layer, between the light reflective layer and the lightabsorbing layer, and on a surface opposite to the surface facing thelight reflective layer of the light absorbing layer. In other words, theprotective layer performs a role of protecting the decoration member bybeing provided between each layer of the decoration member or at anoutermost part of the decoration member.

In the present specification, unless defined otherwise, the “protectivelayer” means a layer capable of protecting other layers of thedecoration member. For example, deterioration of an inorganic materiallayer may be prevented under a humidity resistant or heat resistantenvironment. Alternatively, scratching on an inorganic material layer ora pattern layer by external factors is effectively suppressed enablingthe decoration member to effectively develop dichroism.

In the present specification, unless defined otherwise, the ‘inorganicmaterial layer’ means a light absorbing layer or a light reflectivelayer.

In the present specification, an example of the decoration memberstructure including the protective layer is as follows.

For example, a structure of substrate/protective layer/patternlayer/light reflective layer/light absorbing layer/protective layer orsubstrate/protective layer/pattern layer/light absorbing layer/lightreflective layer/protective layer may be included.

In one embodiment of the present specification, the protective layerincludes an aluminum oxynitride. By the protective layer including analuminum oxynitride (AlON), functions of the protective layer todescribe later may be enhanced compared to when the protective layerdoes not include an aluminum oxynitride (AlON). In addition, functionsof protection may be further enhanced when adjusting a ratio of eachelement of the aluminum oxynitride.

In one embodiment of the present specification, by further including theprotective layer, the decoration member suppresses damages on thepattern layer and the organic material layer even when being leftunattended under a high temperature and high humidity environment, andtherefore, excellent decorative effects may be maintained even under aharsh environment.

The decoration member of the present specification may be used in knownsubjects requiring the use of a decoration member. For example, they maybe used without limit in portable electronic devices, electronic goods,cosmetic containers, furniture, building materials and the like.

A method of using the decoration member in portable electronic devices,electronic goods, cosmetic containers, furniture, building materials andthe like is not particularly limited, and known methods known as amethod of using a deco film in the art may be used. The decorationmember may further include a gluing layer as necessary. In anotherexample, the decoration member may be used in portable electronicdevices or electronic goods by direct coating. In this case, a separategluing layer for attaching the decoration member to the portableelectronic devices or the electronic goods may not be required. Inanother example, the decoration member may be attached to portableelectronic devices or electronic goods using a gluing layer as a medium.As the gluing layer, an optically clear adhesive tape (OCA tape) or anadhesive resin may be used. As the OCA tape or the adhesive resin, OCAtapes or adhesive resins known in the art may be used without limit. Asnecessary, a peel-off layer (release liner) may be further provided forprotecting the gluing layer.

In one embodiment of the present specification, the light reflectivelayer and the light absorbing layer may each be formed on a substrate ora pattern of a pattern layer of the substrate using a sputter method, anevaporation method, a vapor deposition method, a chemical vapordeposition (CVD) method, wet coating and the like. Particularly, thesputter method has straightness, and therefore, a difference in thedeposition thicknesses of both inclined surfaces of the convex portionmay be maximized by tilting a position of a target.

In one embodiment of the present specification, the light reflectivelayer and the light absorbing layer may each be formed using a reactivesputtering method. Reactive sputtering is a method in which ions havingenergy (for example, Ar⁺) impacts a target material, and the targetmaterial come off herein is deposited on a surface to deposit. Herein,the base pressure is 1.0×10⁻⁵ torr or less, 6.0×10⁻⁶ torr or less, andpreferably 3.0×10⁻⁶ torr or less.

In one embodiment of the present specification, the reactive sputteringmethod may be performed in a chamber including a plasma gas and areactive gas. The plasma gas may be argon (Ar) gas. In addition, thereactive gas required to form the inorganic material layer is oxygen(O₂) and nitrogen (N₂), and, as a gas for providing an oxygen ornitrogen atom, is distinguished from the plasma gas.

In one embodiment of the present specification, the plasma gas may havea flow rate of greater than or equal to 10 sccm and less than or equalto 300 sccm, and preferably greater than or equal to 20 sccm and lessthan or equal to 200 sccm. The sccm means a standard cubic centimeterper minute.

In one embodiment of the present specification, a process pressure (p1)in the chamber may be from 1.0 mtorr to 10.0 mtorr, and preferably from1.5 mtorr to 10.0 mtorr. When the process pressure is greater than theabove-mentioned range during the sputtering, Ar particles present insidethe chamber increase, and particles emitted from a target collide withthe Ar particles losing energy, which may decrease a growth rate of thethin film. When the process pressure is maintained too low on the otherhand, an energy loss of the copper oxynitride particles caused by the Arparticles decreases, however, there is a disadvantage in that asubstrate may be damaged due to particles having high energy, orqualities of the protective layer may decrease.

In one embodiment of the present specification, the reactive gas mayhave a fraction of greater than or equal to 30% and less than or equalto 70%, preferably greater than or equal to 40% and less than or equalto 70%, and more preferably greater than or equal to 50% and less thanor equal to 70% with respect to the plasma gas. The reactive gasfraction may be calculated by(Q_(reactive gas)/(Q_(plasma process gas)+Q_(reactive gas))*100%). TheQ_(reactive gas) may mean a flow rate of the reactive gas inside thechamber, and Q_(plasma process gas) may be a flow rate of the plasmaprocess gas inside the chamber. When satisfying the above-mentionednumerical range, the atomic ratio of the copper oxynitride describedabove may be adjusted to a target range.

In one embodiment of the present specification, the reactive sputteringmethod may have driving power of greater than or equal to 100 W and lessthan or equal to 500 W, and preferably greater than or equal to 150 Wand less than or equal to 300 W.

In one embodiment of the present specification, a range of the voltageapplied in the reactive sputtering method may be greater than or equalto 350 V and less than or equal to 500 V. The voltage range may beadjusted depending on the state of the target, the process pressure, thedriving power (process power) or the fraction of the reactive gas.

In one embodiment of the present specification, the reactive sputteringmethod may have a deposition temperature of higher than or equal to 20°C. and lower than or equal to 300° C. When depositing at a temperaturelower than the above-mentioned range, there is a problem in thatparticles come off from the target and reaching the substrate haveinsufficient energy required for crystal growth decreasing crystallinityof thin film growth, and at a temperature higher than theabove-mentioned range, particles come off from the target evaporate orre-evaporate causing a problem of reducing a thin film growth rate.

Hereinafter, the present application will be specifically described withreference to examples, however, the scope of the present specificationis not limited by the following examples.

EXAMPLE AND COMPARATIVE EXAMPLE Comparative Example 1

A prism-shaped pattern layer having each inclined angle of 20 degrees/70degrees was formed by coating an ultraviolet curable resin on a PETsubstrate. After that, a color developing layer including a lightabsorbing layer and a light reflective layer was formed on the patternlayer using a reactive sputtering method.

Specifically, a reactive sputtering method was used, and an argon gasflow rate was adjusted to 50 sccm, an oxygen gas flow rate to 1 sccm anda nitrogen gas flow rate to 10 sccm, and a process pressure wasmaintained at 9 mtorr and power at 200 W. Through this, a 10 nm lightabsorbing layer having a composition of the following Table 3 wasformed. After that, In having a thickness of 70 nm was deposited on thelight absorbing layer using a sputtering method to form a lightreflective layer.

Comparative Example 2

A decoration member was prepared in the same manner as in ComparativeExample 1 except that a 20 nm light absorbing layer having a compositionof the following Table 3 was formed.

Comparative Example 3

A decoration member was prepared in the same manner as in ComparativeExample 1 except that a 30 nm light absorbing layer having a compositionof the following Table 3 was formed.

Example 1

A decoration member was prepared in the same manner as in ComparativeExample 1 except that a 40 nm light absorbing layer having a compositionof the following Table 3 was formed.

Example 2

A decoration member was prepared in the same manner as in ComparativeExample 1 except that a 50 nm light absorbing layer having a compositionof the following Table 3 was formed.

Example 3

A decoration member was prepared in the same manner as in ComparativeExample 1 except that a 60 nm light absorbing layer having a compositionof the following Table 3 was formed.

Light absorbing layer thicknesses, thickness parameters, and componentratios at each location of Comparative Examples 1 to 3 and Examples 1 to3 were measured and shown in the following Table 3.

TABLE 3 Thickness Component Ratio at Each Light Absorbing ParameterLocation (CuaObNc) Layer Thickness T_(x) σ_(x) a b c ω Value (T₁)(Equation 2) (Equation 3) (*10⁻²) (*10⁻²) (*10⁻²) (Equation 1)Comparative 10 nm 0.143 1.2 83 6 11 0.172 Example 1 Comparative 20 nm0.286 1.2 83 6 11 0.343 Example 2 Comparative 30 nm 0.426 1.304 82 6 120.559 Example 3 Example 1 40 nm 0.571 1.304 82 6 12 0.745 Example 2 50nm 0.714 1.667 81 8 11 1.19 Example 3 60 nm 0.857 1.818 80 8 12 1.558

<Evaluation Example (Evaluation on Color)>

Component ratios of the decoration members prepared in the examples andthe comparative examples were analyzed, and colors appearing by eachthickness were observed, and recorded in the following Table 4.

TABLE 4 Lch Coordinate h* Value Color Comparative Example 1 85, 7, 60 60° Warm tone Comparative Example 2 67, 19, 31  31° Comparative Example3 39, 29, 352 352° Example 1 32, 17, 210 210° Cool tone Example 2 45,11, 152 152° Example 3 52, 11, 109 109°

In the decoration members of Example 1 to Example 3, cool colorsappeared, however, warm colors appeared in Comparative Examples 1 to 3.When comparing Comparative Example 3 and Example 1, it was identifiedthat cool colors appeared when changing the thickness even when thecompositions (CuON) of the light absorbing layers were the same.

From the results, it was identified that warm tone colors appeared whenco represented by Equation 1 was 0.7 or less, however, cool tone colorsappeared when co was greater than 0.7.

1. A decoration member comprising: a color developing layer comprising alight reflective layer and a light absorbing layer provided on the lightreflective layer; and a substrate provided on one surface of the colordeveloping layer, wherein the light absorbing layer includes a copperoxynitride (Cu_(a)O_(b)N_(c)); and wherein, when a component analysis isperformed through a transmission X-ray analysis on any one point of thelight absorbing layer, ω represented by the following Equation 1 is 0.71or greater:ω=(T _(x))×(σ_(x))   [Equation 1] wherein in Equation 1, T_(x) isrepresented by Equation 2, and σ_(x) is represented by Equation 3:$\begin{matrix}{{Tx} = {\left\{ {T_{1} - {\left\lbrack \frac{T_{1}}{T_{0}} \right\rbrack \times T_{0}}} \right\} \times \left( T_{0} \right)^{- 1}}} & \left\lbrack {{Equation}\mspace{14mu} 2} \right\rbrack \\{{\sigma_{x} = \frac{10b}{a - {3c}}};} & \left\lbrack {{Equation}\mspace{14mu} 3} \right\rbrack\end{matrix}$ wherein in Equation 2, T₁ is a thickness of the lightabsorbing layer including the any one point of the light absorbing layeron which the component analysis is performed,$\left\lbrack \frac{T_{1}}{T_{0}} \right\rbrack$ is a maximum integerthat is not greater than $\frac{T_{1}}{T_{0}},$ and T₀ is 70 nm; whereinwhen T₁ is m*T₀, T_(x) is 1, wherein when T₁ is not m*T₀, Tx satisfiesEquation 2, and wherein m is an integer of 1 or greater; and wherein inEquation 3, a is an element content ratio of copper (Cu), b is anelement content ratio of oxygen (O), and c is an element content ratioof nitrogen (N).
 2. The decoration member of claim 1, wherein Tx isgreater than or equal to 0.51 and less than or equal to
 1. 3. Thedecoration member of claim 1, wherein σ_(x) is greater than or equal to1.1 and less than or equal to 1.9.
 4. The decoration member of claim 1,wherein a hue-angle h* in CIE LCh color space of the light absorbinglayer is in a range of 105° to 315°.
 5. The decoration member of claim1, wherein the light reflective layer is a single layer or a multilayercomprising one or more materials selected from the group consisting ofindium (In), titanium (Ti), tin (Sn), silicon (Si), germanium (Ge),aluminum (Al), copper (Cu), nickel (Ni), vanadium (V), tungsten (W),tantalum (Ta), molybdenum (Mo), neodymium (Nd), iron (Fe), chromium(Cr), cobalt (Co), gold (Au), silver (Ag), oxides thereof, nitridesthereof, oxynitrides thereof, carbon and carbon composites.
 6. Thedecoration member of claim 1, wherein the light absorbing layer has arefractive index of 0 to 8 at a wavelength of 400 nm.
 7. The decorationmember of claim 1, wherein the light absorbing layer has an extinctioncoefficient of greater than 0 and less than or equal to 4 at awavelength of 400 nm.
 8. The decoration member of claim 1, wherein thelight absorbing layer includes two or more points with differentthicknesses.
 9. The decoration member of claim 1, wherein the colordeveloping layer further comprises a color film.
 10. The decorationmember of claim 1, wherein the substrate comprises a pattern layer, andthe pattern layer is provided adjacent to the color developing layer.11. The decoration member of claim 10, wherein the pattern layercomprises a convex portion or a concave portion having anasymmetric-structured cross-section.
 12. The decoration member of claim1, which has a dichroism of ΔE*ab>1, wherein (ΔE*ab) is a distance in aL*a*b* space in a color coordinate CIE L*a*b*, L* is a distance from Laxis and a* and b* are Cartesian coordinates.
 13. The decoration memberof claim 1, wherein the substrate comprises a plastic injection moldedarticle or a glass substrate for a cosmetic container.
 14. Thedecoration member of claim 13, wherein the plastic injection moldedarticle comprises one or more selected from the group consisting ofpolypropylene (PP), polystyrene (PS), polyvinyl acetate (PVAc),polyacrylate, polyethylene terephthalate (PET), polyvinyl chloride(PVC), polymethyl methacrylate (PMMA), an ethylene-vinyl acetatecopolymer (EVA), polycarbonate (PC), polyamide and astyrene-acrylonitrile copolymer.